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http://www.scirp.org/journal/PaperInformation.aspx?PaperID=53664#.VM8pbCzQrzE
Author(s)
Affiliation(s)
1Departamento de Física, Centro de Investigación y de Estudios Avanzados del I.P.N., México D.F., México.
2Laboratorio de Nanoestructuras Semiconductoras, Universidad Nacional de Colombia, Manizales, Colombia.
2Laboratorio de Nanoestructuras Semiconductoras, Universidad Nacional de Colombia, Manizales, Colombia.
ABSTRACT
GaAs/In
bilayers were prepared by RF Magnetron Sputtering in an Ar atmosphere
on Si (100) substrates using high purity (95.95%) GaAs (100) and In
targets. The growth temperatures were 300oC and 580oC
for the high purity targets of In and GaAs, respectively. Three samples
were prepared: the deposition time (td) for the GaAs layers was fixed
to 30 minutes, while varied for the In layers from td = 10, 15, and 20
minutes. The morphological and optical studies of the samples were made
by means of Amplitude Modulation Atomic Force Microscopy (AM-AFM). In
order to analyze and correlate surface morphology and alloy composition
properties, the as-prepared samples were cleaved along the [001]
direction and subsequently studied by AM-AFM-micrographs. From
topographic images, a statistical study of the roughness and grain size
was made. Additionally, cross sectional AM-AFM-micrographs were
performed for each sample, where the phase channel, which is sensitive
to the material properties of the specimen, was of particular interest.
Cite this paper
References
Venegas,
M. , Correa, R. , López, M. and Mora, Á. (2015) Atomic Force Microscopy
Studies on GaAs/In Bilayers Deposited on Si (100). Microscopy Research, 3, 6-16. doi: 10.4236/mr.2015.31002.
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