Read full paper at: http://www.scirp.org/journal/PaperInformation.aspx?PaperID=52836#.VKoBocnQrzE Author(s) Jing Zhu , Shuang Chen , Baohe Wang , Xiaorong Zhang Affiliation(s) Research and Development Center of Petrochemical Technology, Tianjin University, Tianjin, China . ABSTRACT Hexafluorobutadiene is a new plasma etching gas for semiconductor molectron which has perfect properties and also is a preceding monomer that can be used for synthesizing many fluorinated compounds. This paper described the different synthesis methods of perflurobutadiene from different materials, and contrasted the characteristic of each synthetic method. The route from tetrafluoroethylene has more industrialization prospects...
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