Read full paper at: http://www.scirp.org/journal/PaperInformation.aspx?PaperID=50286#.VDSJZFfHRK0 Author(s) Satoshi Yamauchi , Kazuhiro Ishibashi , Sakura Hatakeyama Affiliation(s) Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan . ABSTRACT Low pressure chemical vapor deposition (LPCVD) of anatase TiO 2 as a reduction gas was demonstrated at pres- sure of 3 mtorr in comparison to that using TTIP and O 2 with study for the property of the layers. Dissociation energy of TTIP in H 2 was higher than that in O 2 but resistivity of the layer deposited in H 2 was significantly decreased to 0.2 Ω cm in contrast to the high resistivity beyond 100 Ω cm of the layer deposited in O 2 . UV-Vis optical transmissi...
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