跳至主要内容

Solid-State Reaction and Vacancy-Type Defects in Bilayer Fe/Hf Studied by the Slow Positron Beam

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http://www.scirp.org/journal/PaperInformation.aspx?PaperID=53699#.VM85lSzQrzE

Author(s)  
  1. Yamada1, T. Sasaki1, T. Nagata1, I. Kanazawa1*, R. Suzuki2, T. Ohdaira2, K. Nozawa3, F. Komori3
  2.  
Affiliation(s)
1Department of Physics, Tokyo Gakugei University, Tokyo, Japan.
2The National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan.
3Institute of Solid State Physics, University of Tokyo, Chiba, Japan.

ABSTRACT
The positron annihilation lifetimes and the Doppler broadening by slow positron beam are measured in thin Fe films with thickness 500 nm, a thin Hf film with thickness 100 nm, and the bilayer Fe (50 nm)/Hf (50 nm) on quartz glass substrate. We have analyzed the behavior in vacancy-type defects in each layer through some deposition temperatures and annealing. It is observed that the thin Fe film, the thin Hf film, and the bilayer Fe (50 nm)/Hf (50 nm) already contain many vacancy-type defects. We have investigated the change of densities of the vacancy-carbon complex and the small vacancy-cluster with carbons, through solid-state amorphization of Fe (50 nm)/Hf (50 nm) bilayer.

KEYWORDS
Metallic Films, Positron Annihilation Measurement, Solid-State Reaction, Fe Film, Diffusion, Vacancy-Type Defects

Cite this paper
Yamada, K. , Sasaki, T. , Nagata, T. , Kanazawa, I. , Suzuki, R. , Ohdaira, T. , Nozawa, K. and Komori, F. (2015) Solid-State Reaction and Vacancy-Type Defects in Bilayer Fe/Hf Studied by the Slow Positron Beam. Journal of Applied Mathematics and Physics, 3, 233-239. doi: 10.4236/jamp.2015.32034.

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